Low frequency noise in GaN metal semiconductor and metal oxide semiconductor field effect transistors
نویسندگان
چکیده
منابع مشابه
Compact Model of Low-Frequency Noise in Nanoscale Metal-Oxide-Semiconductor Field Effect Transistors
The future of mixed-signal, memory, and microprocessor technologies are dependent on ever increasing analog and digital integration, higher cell densities, and demand for more processing power. However, device variability creates challenges at each technology node which decreases yield, performance, and noise margins [1]. At these device dimensions the low-frequency noise (LFN) is dominated by ...
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We report on the influence of the channel doping on dc, high frequency, and noise performance of GaN metal–semiconductor field-effect transistors ~MESFETs! grown on sapphire substrates. The devices with the channel thicknesses from 50 to 70 nm and doping levels up to 1.5310 cm were investigated. An increase in the channel doping results in the improved dc characteristics, higher cutoff, and max...
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The noise characteristics of today’s short-channel devices are shown to have a better resemblance to ballistic devices than to long-channel metal oxide semiconductor field effect transistors MOSFETs . Therefore the noise characteristics of these devices are best modeled using a ballistic-MOSFET-based noise model. Extensive hydrodynamic device simulations are presented in support of this hypothe...
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In this paper, electrical characteristics of nanoscale single-, double-, and all-around-gate silicon-0n-insulator (SOI) devices are computational investigated by using a quantum mechanical simulation. Considering several important properties, such as on/off current ratio, drain induced channel barrier height lowering, threshold voltage roll off, and subthreshold swing, geometry aspect ratio is ...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2001
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.1372364